Non-stoichiometric Niox ceramic target

Non-stoichiometric Niox ceramic target

  • CN 1,628,185 A
  • Filed: 02/04/2003
  • Published: 06/15/2005
  • Est. Priority Date: 02/06/2002
  • Status: Active Application
First Claim
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1. a cathode sputtering device, with the target of mainly being made by pottery of the auxiliary cathode sputtering device in magnetic field, described target mainly contains nickel oxide NiO especially x, it is characterized in that with respect to stoichiometric composition the oxygen of nickel oxide is insufficient.

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