Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

  • CN 1,629,733 A
  • Filed: 12/14/2004
  • Published: 06/22/2005
  • Est. Priority Date: 12/15/2003
  • Status: Active Application
First Claim
Patent Images

1. lithographic equipment comprises:

  • Irradiation system is used to provide radiation laser beam;

    Supports for articles structure, described supports for articles structure are used for the article in described radiation laser beam light path to be placed are supported thereon;

    Be arranged at the backfill gas conveying device in the described supporting structure, be used for carrying backfill gas with backfill gas pressure to the back side of described article when described article during by described supports for articles support structure;

    Electrostatic clamping device is used in projection process described article being held on described supports for articles structure;

    AndController is used for controlling at least one of described clamping device and described backfill gas pressure, and described backfill gas pressure is used for discharging described article from described supports for articles structure.

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