Tin oxide powder for ITO sputtering target, manufacturing method of said powder, sintered body sputtering target for ITO film deposition, and manufacturing method of said target
Tin oxide powder for ITO sputtering target, manufacturing method of said powder, sintered body sputtering target for ITO film deposition, and manufacturing method of said target
- CN 1,633,516 A
- Filed: 02/15/2002
- Published: 06/29/2005
- Est. Priority Date: 03/12/2001
- Status: Abandoned Application
- EN CH
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- Pin
