Flatness simulation system for mask substrate

Flatness simulation system for mask substrate

  • CN 1,652,022 A
  • Filed: 05/31/2002
  • Published: 08/10/2005
  • Est. Priority Date: 05/31/2001
  • Status: Active Application
First Claim
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1. , a kind of flatness simulation system of mask substrate is characterized in that comprising:

  • Obtain the unit of the planarization first information, that measure substrate of planarization of the interarea of relevant mask substrate;

    AndObtain by carry out according to the above-mentioned first information and the information relevant with the mask sucker structure of exposure device the aforementioned mask substrate is arranged at above-mentioned exposure device the time the unit of second information of simulation flatness that obtain, relevant above-mentioned interarea.

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