Resistor structures to electrically measure unidirectional misalignment of stitched masks

Resistor structures to electrically measure unidirectional misalignment of stitched masks

  • CN 1,723,419 A
  • Filed: 12/04/2003
  • Published: 01/18/2006
  • Est. Priority Date: 12/13/2002
  • Status: Active Application
First Claim
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1. , a kind of equipment that is used for the aligning of electrical measurement stitched mask comprises:

  • Be used to measure first testing cushion 101 and second testing cushion 102 of resistance therebetween;

    Be electrically connected to first resistive element 105,115 of first testing cushion 101 at first end;

    Be electrically connected to second resistive element 110,125 of second testing cushion 102 at first end;

    Described first resistive element 105,115 and described second resistive element 110,125 are electrically connected by vertical shift 112;

    First testing cushion 101 that wherein records and the resistance between second testing cushion 102 change according to first resistive element 105,115 and second resistive element, 110,125 alignings with respect to vertical shift 112.

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