Controlling electromechanical behavior of structures within a microelectromechanical systems device

Controlling electromechanical behavior of structures within a microelectromechanical systems device

  • CN 1,723,571 A
  • Filed: 09/18/2003
  • Published: 01/18/2006
  • Est. Priority Date: 09/20/2002
  • Status: Active Grant
First Claim
Patent Images

1. method that is used to make MEMS devices, this method comprises:

  • Make ground floor, it comprises at least a film with feature electomechanical response and characteristic optical response, and wherein said characteristic optical response needs, and described feature electomechanical response is unwanted;

    AndRevise the described feature electomechanical response of described ground floor by being controlled at described in the described MEMS devices driving process accumulation of electric charge on the ground floor.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×