Apparatus for heating substrate and method for controlling temperature of susceptor for heated substrate

Apparatus for heating substrate and method for controlling temperature of susceptor for heated substrate

  • CN 1,733,966 A
  • Filed: 08/19/2002
  • Published: 02/15/2006
  • Est. Priority Date: 08/23/2001
  • Status: Active Application
First Claim
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1. equipment that is used for heated substrate comprises:

  • The pedestal that is fit to supporting substrate;

    First and second heating units, described first and second heating units are provided with respectively, and to heat first and second parts of described pedestal, the described second section of wherein said pedestal is positioned at outside the described first part of described pedestal radially;

    Produce first thermopair of first temperature reading;

    Produce second thermopair of second temperature reading;

    WithHeater controller, it is connected in order to first electric current is provided and provides second electric current to described second heating unit for described first heating unit, and wherein said heater controller responds described temperature reading and controls these electric currents;

    Wherein said second thermopair is coupled to the third part of described pedestal, and described third part is between described first and second parts;

    AndWherein said first thermopair is coupled to the 4th part of described pedestal, and this part is positioned within the described third part of described pedestal radially.

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