Apparatus and method for controlled application of reactive vapors to produce thin films and coatings

Apparatus and method for controlled application of reactive vapors to produce thin films and coatings

  • CN 1,735,708 A
  • Filed: 06/10/2004
  • Published: 02/15/2006
  • Est. Priority Date: 06/27/2003
  • Status: Active Application
First Claim
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1. device that is used for the vapour deposition of coating, described coating has the thickness from about 5 dusts to about 1000 dust scopes, wherein, at least a presoma that is used to form described coating shows the vapour pressure that is lower than about 150Torr under 25 ℃

  • temperature, and described device comprises;

    At least one precursor container is wherein placed described at least a presoma with liquid or solid form;

    At least one precursor vapor pond is used to preserve the steam of described at least a presoma;

    At least one equipment, control precursor vapor stream from described precursor container to described precursor vapor pond;

    Pressure transmitter is communicated with described precursor vapor pond;

    Process controller, described process controller receives data from described pressure transmitter, with the specified steam pond pressure ratio of described data and expectation, and send signal to the equipment of the steam flow of a control from described precursor container to described precursor vapor pond, so that when reaching the rated pressure of described expectation, prevent that steam flow from further entering in the described precursor vapor pond;

    Control enters the equipment of the precursor vapor stream in the described precursor vapor pond when the signal of receiving from described first process controller;

    Treatment chamber is used for the substrate of described coating vapour deposition at described treatment chamber;

    WithControl enters the equipment of the precursor vapor stream in the described treatment chamber when the signal of receiving from described process controller.

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