Method of manufacturing semiconductor device and display device

Method of manufacturing semiconductor device and display device

  • CN 1,745,466 A
  • Filed: 01/30/2004
  • Published: 03/08/2006
  • Est. Priority Date: 02/06/2003
  • Status: Active Application
First Claim
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1. the manufacture method of a semiconductor device is characterized in that, hasThe 1st solution injection unit that use to spray conductive material form the operation of wiring,Use the 2nd solution injection unit in described wiring, form the resist mask operation andAs mask, use atmospheric pressure plasma device described wiring to be carried out the operation of etching with described resist mask with wire plasma generating unit.

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