Method and device for in situ forming nanometer structure

Method and device for in situ forming nanometer structure

  • CN 1,762,789 A
  • Filed: 10/18/2004
  • Published: 04/26/2006
  • Est. Priority Date: 10/18/2004
  • Status: Active Application
First Claim
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1. , a kind of device that is used for original position formation nanostructured is characterized in that, comprising:

  • One isolation ward (1), its inside is filled with gas;

    One heater (11) is arranged on the bottom of this isolation ward (1);

    Material to be evaporated (9) is arranged on the heater (11);

    One base material (4) is arranged on this isolation ward (1) top, apart from the position of this material to be evaporated and heater (11) one preset distances;

    WithOne cooling chamber (2) is close to the top that this base material (4) is arranged on this base material, is used for this base material is cooled off;

    Wherein when this heater will this material to be evaporated be heated to boiling point, this material to be evaporated changes gaseous state into, under the carrying of this isolation ward internal gas, move upward, when touching lower this substrate surface of temperature, condensation forms solid-state and is deposited in the surface of base material, thereby forms nanostructured on the surface of base material.

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