Method for removal of deposition, method for protection of optical element, device manufacturing method and lithographic apparatus

Method for removal of deposition, method for protection of optical element, device manufacturing method and lithographic apparatus

  • CN 1,766,731 B
  • Filed: 09/30/2005
  • Issued: 04/09/2014
  • Est. Priority Date: 10/04/2004
  • Status: Active Grant
First Claim
Patent Images

1. removal comprises the sedimental method of Sn on the optical element of equipment of optical element,Wherein said equipment is lithographic equipment (1), and described lithographic equipment also comprises:

  • Hydroperoxyl radical generator, it is configured to from containing H 2h in gas (155) 2generate hydroperoxyl radical (120,165), and Sediment generator, it is configured to generate sediment,Described method comprises;

    By deposition process, to optical element (100), provide cap rock (125),Wherein by filament (110), plasma or be configured to H 2convert the catalyzer of hydroperoxyl radical to from the described H of containing 2h in gas 2generate at least a portion of described hydroperoxyl radical (120,165);

    It is characterized in that, between the operating period of described equipment, remove at least a portion of this cap rock (125) in removal process from optical element, described removal process comprises;

    In at least a portion of this equipment, provide and contain H 2gas;

    From containing H 2h in gas 2produce hydroperoxyl radical;

    And The optical element (100) of (125) that makes to have cap rock contacts with at least part of hydroperoxyl radical, and removes at least a portion of this cap rock.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×