Apparatus for treating thin film and method of treating thin film

Apparatus for treating thin film and method of treating thin film

  • CN 1,796,599 A
  • Filed: 10/17/2005
  • Published: 07/05/2006
  • Est. Priority Date: 12/30/2004
  • Status: Active Application
First Claim
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1. , a kind of treatment unit of substrate upper film comprises:

  • Be fit to hold the worktable of substrate;

    Relative with described substrate and have a spatial gas shroud;

    Be arranged on energy source on the described substrate of part by described space;

    Move first operating unit of described gas shroud;

    AndMove second operating unit of described energy source.

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