Method and apparatus for placing assist features

Method and apparatus for placing assist features

  • CN 1,801,159 A
  • Filed: 12/30/2005
  • Published: 07/12/2006
  • Est. Priority Date: 01/03/2005
  • Status: Active Application
First Claim
Patent Images

1. the method for a placing assist features in layout comprises:

  • Receive the layout of an integrated circuit;

    In this layout, select evaluation point;

    Utilization is discerned the position of long mutually interfering nodes and destructive interference node at the image intensity Grad of a spatial image at described evaluation point place;

    Wherein said spatial image is to use an image intensity model, described layout, and calculate by the one or more representative supplemental characteristics of placement in described layout;

    AndBased on the position of described long mutually interfering nodes and destructive interference node, placing assist features in described layout.

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