Plasma reactor overhead source power electrode

Plasma reactor overhead source power electrode

  • CN 1,812,684 A
  • Filed: 01/20/2006
  • Published: 08/02/2006
  • Est. Priority Date: 01/28/2005
  • Status: Active Application
First Claim
Patent Images

1. one kind is radially extended gas distribution electrode, in the described reactor that workpiece on being used for the vacuum chamber base for supporting of article on plasma reactor is handled, described electrode forms at least a portion of described reactor head, described electrode is the RF plasma source power applicator of described reactor and has the basal surface of facing described reactor for treatment district that described electrode comprises:

  • The gas supply manifold, it is used for the processing gas under described top of electrodes place reception supply pressure;

    A plurality of pressure drop cylindrical holes, its described gas supply manifold from an end in each hole extends axially with respect to described electrode;

    The radial gas distribution manifold, it radially extends along described electrode in described electrode;

    A plurality ofly extend axially high on-state rate gas channel, it is coupled to described radial gas distribution manifold with each opposite end in described a plurality of pressure drops hole;

    WithThe cylindrical venthole of a plurality of high on-state rates, it is formed in the described basal surface of described electrode and extends axially described radial gas distribution manifold.

View all claims

    Thank you for your feedback