Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

  • CN 1,821,881 B
  • Filed: 12/14/2005
  • Issued: 07/18/2012
  • Est. Priority Date: 12/15/2004
  • Status: Active Grant
First Claim
Patent Images

1. lithographic equipment comprises:

  • Optical projection system, it is configured to and can the patterning radiation laser beam be projected on the substrate that is supported by substrate table;

    Liquid-supplying system;

    It is configured to and can in the space between said optical projection system and the substrate, liquid be provided;

    Said liquid-supplying system comprises the liquid limiting structure;

    Said liquid limiting structure has formed sealing along at least a portion border in the last element of optical projection system and the space between the substrate table and extend between liquid limiting structure and substrate surface;

    Sealing surface, it is configured to replace said substrate and is that the liquid that said liquid-supplying system provided provides limiting surface;

    WithThe sealing surface locating device, it is configured to when adopting said sealing surface to limit the liquid that is provided by said liquid-supplying system, can between said liquid limiting structure and sealing surface, form and keep the gap,Wherein, said liquid-supplying system is arranged to make said liquid (11) to be recycled to outlet (14) through said gap, thereby makes and to be removed from said liquid (11) from any particle quilt of in sealing surface (20) and the liquid limiting structure (12) or another,Wherein, said sealing surface locating device includes an inlet and an outlet, they be configured to can be between fluid applied force that provides by said inlet and the low pressure that provides by said outlet the equilibrium establishment state, perhaps,Said sealing surface is formed on the closure plate, and said sealing surface locating device comprises anchor clamps, its be configured to can be on the surface of the liquid in said liquid-supplying system not the said closure plate of clamping, perhapsSaid sealing surface locating device comprises the magnet on each that is arranged in said liquid limiting structure and sealing surface,Said sealing surface locating device comprises and is configured to pin system that said sealing surface is removed from said substrate table.

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