Methods and systems for inspection of wafers and reticles using designer intent data

Methods and systems for inspection of wafers and reticles using designer intent data

  • CN 1,846,170 A
  • Filed: 07/02/2004
  • Published: 10/11/2006
  • Est. Priority Date: 07/03/2003
  • Status: Active Application
First Claim
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1. computer implemented method, described method comprises:

  • based on the inspection data of checking that mask produced, the interference defective on the identification of wafer wherein, before checking described wafer, uses described mask to form figure on described wafer.

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