Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

  • CN 1,853,142 A
  • Filed: 07/20/2004
  • Published: 10/25/2006
  • Est. Priority Date: 07/21/2003
  • Status: Active Grant
First Claim
Patent Images

1. a lithographic apparatus (1) comprising:

  • -be used to provide the radiating system of tomographic projection light beam;

    -being used to support the supporting construction that pattern forms device, described pattern forms device and is used for making described projected light beam patterning according to required pattern;

    -be used for fixing the substrate table (WT) of substrate;

    -be used for the optical projection system (PL) on the target part that projected light beam with described patterning projects to described substrate;

    And-at least one is used for providing the purified-gas supply system (100) of Purge gas to described lithographic apparatus to small part;

    Described purified-gas supply system comprises;

    -purge gas mixture maker (120), it comprises and is configured to the humidification device (150) that moisturizes to Purge gas, described purge gas mixture maker (120) is configured to be used to produce purge gas mixture, and described purge gas mixture comprises at least a Purge gas and described moisture;

    AndBeing used on the described purge gas mixture maker of-connection is fed to described purge gas mixture outlet (130-132) to the small part lithographic apparatus with described purge gas mixture.

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