Aqueous cleaning composition for removing residues and method using same

Aqueous cleaning composition for removing residues and method using same

  • CN 1,949,085 A
  • Filed: 10/16/2006
  • Published: 04/18/2007
  • Est. Priority Date: 10/14/2005
  • Status: Active Application
First Claim
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1. one kind is used for from the get on composition of removal of residue of substrate, and said composition comprises:

  • Water;

    Quaternary ammonium hydroxide;

    Fluorochemicals;

    WithOptional corrosion inhibiter,Wherein said composition is substantially free of the organic solvent of interpolation, andWherein said composition has the pH greater than 9.

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