Aqueous cleaning composition for removing residues and method using same

Aqueous cleaning composition for removing residues and method using same

  • CN 1,949,085 B
  • Filed: 10/16/2006
  • Issued: 10/15/2014
  • Est. Priority Date: 10/14/2005
  • Status: Active Grant
First Claim
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1. for a composition for the removal of residue that gets on from substrate, said composition is comprised of following material:

  • Water;

    Quaternary ammonium hydroxide, it comprises having general formula [N-R 1r 2r 3r 4] +oH -compound, R wherein 1, R 2, R 3and R 4alkyl, hydroxy alkyl and their combination independently of one another;

    The compound of fluoride, it comprises and is selected from following at least one;

    have general formula R 5r 6r 7r 8the compound of NF, wherein R 5, R 6, R 7and R 8hydrogen, alcohol radical, alkoxy, alkyl and their combination independently of one another;

    Fluoboric acid, hydrofluorite, fluoridize choline, borofluoride, six aluminum fluorides;

    The fluoride salt of the primary, secondary or tertiary amine of aliphatic series;

    With their potpourri;

    Optional corrosion inhibiter, be selected from least one in the middle of following;

    the ester of organic acid, acylate, catechol, resorcinol, phenol, maleic anhydride, phthalic anhydride, 1,2,3,-thrihydroxy-benzene, benzotriazole, diethyl hydramine, fructose, ATS (Ammonium thiosulphate), tetramethyl guanidine, thioglycerin, gallic acid and their potpourri, andWherein said composition does not contain the organic solvent adding, andWherein said composition has the pH that is greater than 9.

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