Fabrication method of photomask-blank

Fabrication method of photomask-blank

  • CN 1,955,840 B
  • Filed: 10/16/2006
  • Issued: 02/01/2012
  • Est. Priority Date: 10/24/2005
  • Status: Active Grant
First Claim
Patent Images

1. the manufacturing approach of a photomask-blank comprises:

  • The step of utilizing flash of light that formed blooming on transparent substrates is shone,Wherein under said transparent substrates being installed in, carry out said irradiation by situation about said flash of light being had on the substrate support member of processing than the glass material of low transmissivity;

    Said substrate support member is the stacked structure with n layer light transmissive material;

    And the one deck at least in the n layer has the opacity to said flash of light that is different from other layer;

    Wherein n is equal to or greater than 2 natural numberWherein said stacked structure comprise to said flash of light transparent the layer and to said flash of light have than low transmissivity the layer stacked, andWherein in 300nm arrives the wavelength coverage of 600nm;

    With regard to using the measured reflectivity of integrating sphere;

    Said substrate support member to the opacity of said flash of light more than or equal to 10%;

    And with regard to using the measured transmissivity of integrating sphere, said substrate support member is equal to or less than 85% to the opacity of said flash of light.

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