System and method for modulating power of PECVD discharge source and related function

System and method for modulating power of PECVD discharge source and related function

  • CN 1,958,840 A
  • Filed: 11/01/2006
  • Published: 05/09/2007
  • Est. Priority Date: 11/01/2005
  • Status: Active Application
First Claim
Patent Images

1. the method for a produced film in the chemical vapour deposition process, this method comprises:

  • Generation has first electricimpulse of first pulse width;

    Use first electricimpulse, produce the atomic group material of first density;

    Use the first part of the atomic group material decomposition unstripped gas of first density, produce deposition material thus;

    Deposition material is deposited on the substrate as the first layer;

    Generation has second electricimpulse of second pulse width, and wherein, second pulse width is different with first pulse width;

    Use second electricimpulse, produce the atomic group material of second density;

    Use the second section of the atomic group material decomposition unstripped gas in the atomic group material of second density, produce more than second kind of deposition material thus;

    WithDeposition material is deposited on the first layer.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×