Apparatus and methods for slurry cleaning of etch chambers

Apparatus and methods for slurry cleaning of etch chambers

  • CN 1,970,230 A
  • Filed: 11/13/2006
  • Published: 05/30/2007
  • Est. Priority Date: 11/14/2005
  • Status: Active Application
First Claim
Patent Images

1. device, it comprises:

  • (a) fog-spray nozzle is suitable for producing the abrasion mortar of atomizing, and this fog-spray nozzle has the grey slurry inlet of abrasion, atomizing fluids import and the outlet of atomizing abrasion mortar;

    (b) abrasion mortar container, this abrasion mortar fluid container is communicatively connected to the grey slurry inlet of abrasion and is defined for the space of the mortar that comprises water and abrasion particulate;

    With(c) atomized flow body source, this fluid source fluid is communicatively connected to the atomizing fluids import.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×