Microwave plasma device for preparing diamond thin-film and etching carbon film

Microwave plasma device for preparing diamond thin-film and etching carbon film

  • CN 2,898,057 Y
  • Filed: 03/27/2006
  • Issued: 05/09/2007
  • Est. Priority Date: 03/27/2006
  • Status: Active Grant
First Claim
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1. , a kind of microwave plasma device for preparing diamond thin and etched carbon film, which comprises at least the magnetron of a generation microwave source, it is characterized in that this magnetron (1) is connected to microwave resonator (14) by a rectangular waveguide (8), three screw impedance tuners (4) at least, in microwave resonator (14), be provided with the silica tube reaction chamber, on the limit of microwave resonator (14), also be connected to a short-circuit plunger (9).

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