The radio frequency sputtering method of preparation semiconductor compound thin film

The radio frequency sputtering method of preparation semiconductor compound thin film

  • CN 85,100,504 A
  • Filed: 04/01/1985
  • Published: 08/13/1986
  • Est. Priority Date: 04/01/1985
  • Status: Abandoned Application
First Claim
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1. , a kind of preparation has the RF sputtering method of the III-V family semiconductor compound thin film of high-vapor-pressure component, and the group-v element material that it is characterized in that using the semiconducting compound particle that will make or bulk ingot and a small amount of high vapour pressure component is together as sputtering target.

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