ARTICLE FOR USE IN A SEMICONDUCTOR PROCESSING CHAMBER AND METHOD OF FABRICATING SAME
First Claim
1. A method of coating an aluminum surface of an article utilized in a semiconductor processing chamber, the method comprising:
- heating a coating material that prevents penetration of fluoride and/or fluoride containing compounds therethrough to a semi-liquid, semi-solid state; and
depositing the heated coating material on the aluminum surface.
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Accused Products
Abstract
An article having a protective coating for use in semiconductor applications and method for making the same is provided. In one embodiment, a method of coating an aluminum surface of an article utilized in a semiconductor deposition chamber includes the steps of heating a coating material to a semi-liquidous state, the coating material comprising at least one material from the group consisting of aluminum fluoride and magnesium fluoride and depositing the heated coating material on the aluminum surface. The protective coating has a beta phase grain orientation of less than about 10 percent that has good adhesion to aluminum and resists cracking, flaking and peeling. Some articles that may be advantageously coated include showerheads, blocker plates, support assemblies and vacuum chamber bodies, among others.
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Citations
37 Claims
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1. A method of coating an aluminum surface of an article utilized in a semiconductor processing chamber, the method comprising:
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heating a coating material that prevents penetration of fluoride and/or fluoride containing compounds therethrough to a semi-liquid, semi-solid state; and
depositing the heated coating material on the aluminum surface. - View Dependent Claims (2, 3)
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4. A method of coating an aluminum surface of an article utilized in a semiconductor processing chamber, the method comprising:
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heating a material to a semi-liquid, semi-solid state, the material including aluminum fluoride, magnesium fluoride or both; and
allowing the heated material to form a layer on the aluminum surface. - View Dependent Claims (5, 6, 7)
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8. A method of coating an aluminum surface on a substrate support comprising:
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heating aluminum fluoride to a semi-liquid, semi-solid state; and
contacting at least a portion of the heated aluminum fluoride with the aluminum surface. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of coating an aluminum surface on a substrate support comprising:
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forming a plasma from an inert gas;
heating aluminum fluoride with the plasma; and
spraying the heated aluminum fluoride on the aluminum surface. - View Dependent Claims (20, 21, 22)
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23. An article for use in a semiconductor processing chamber, comprising:
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a showerhead, a gas distribution plate, a face plate, a blocker plate, a support assembly or a vacuum chamber body having an aluminum surface; and
a coating comprising aluminum fluoride, magnesium fluoride or both applied in a semi-liquid, semi-solid state to the aluminum surface. - View Dependent Claims (24, 25)
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- 26. A substrate support having an aluminum surface coated with aluminum fluoride, said aluminum fluoride coating applied by a method comprising heating aluminum fluoride to a semi-liquidous state and applying the heated aluminum fluoride to the aluminum surface.
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30. A substrate support having an aluminum surface coated with aluminum fluoride, said aluminum fluoride coating applied by a method comprising:
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spraying aluminum fluoride powder having a grain orientation of at least 90 percent in the alpha phase through a plasma formed from an inert gas; and
depositing the sprayed aluminum fluoride on the aluminum surface, wherein the deposited aluminum fluoride has less than 10 percent beta phase grain structure. - View Dependent Claims (31, 32, 33)
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34. An article for use in a semiconductor process chamber, comprising:
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a showerhead, a gas distribution plate, a face plate, a blocker plate, a support assembly or a vacuum chamber body having an aluminum surface;
a coating comprising an aluminum fluoride layer applied in a semi-liquid, semi-solid state to the aluminum surface and having less than 10 percent beta phase grain structure.
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35. A substrate support comprising:
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a support body having an aluminum surface;
a heating element disposed in the support body; and
a coating comprising an aluminum fluoride or magnesium fluoride layer applied in a semi-liquid, semi-solid state to the aluminum surface.
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36. A substrate support comprising:
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a support body having an aluminum first surface and an opposing second surface;
a heating element disposed in the support body;
a passage formed through the support body between the first surface ad the second surface, and adapted to evacuate a region between the first surface of the support body and a substrate positioned thereon; and
a coating comprising an aluminum fluoride layer applied in a semi-liquid, semi-solid state to the aluminum surface and having less than 10 percent beta phase grain structure. - View Dependent Claims (37)
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Specification