Photomask, method for producing the same, and method for forming pattern using the photomask
First Claim
1. A photomask comprising on a transparent substrate:
- a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion.
1 Assignment
0 Petitions
Accused Products
Abstract
A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each other, whereas the peripheral portion transmits the exposure light in a phase opposite to that of the light-transmitting portion. A phase shift film that transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in the semi-light-shielding portion formation region.
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Citations
35 Claims
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1. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising;
a first step of forming a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion on the transparent substrate in the semi-light-shielding portion formation region, and a second step of digging down the transparent substrate in the light-transmitting portion formation region so as to have a thickness that transmits the exposure light in a phase opposite to that of the peripheral portion after the first step. - View Dependent Claims (28, 29, 30, 31, 32, 33)
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34. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising;
a first step of forming a phase adjusting film that transmits the exposure light in a phase opposite to that of the peripheral portion and a transmittance adjusting film having a transmittance lower than that of the transparent substrate with respect to the exposure light sequentially on an entire surface of the transparent substrate, a second step of removing the phase adjusting film and the transmittance adjusting film in the peripheral portion formation region, and a third step of removing the transmittance adjusting film in the light-transmitting portion formation region after the second step, wherein the phase adjusting film and the transmittance adjusting film formed on the transparent substrate in the semi-light-shielding portion formation region constitute the phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion. - View Dependent Claims (35)
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Specification