Device and method for manipulation and routing of a metrology beam

• US 20040233494A1
• Filed: 03/05/2004
• Published: 11/25/2004
• Est. Priority Date: 03/06/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Klijntunte, Engelbertus Johannes Jeroen, Van Der Pasch, Engelbertus Antonius Fransiscus, Eussen, Emiel Jozef Melanie, Beems, Marcel Hendrikus Maria
• Granted Patent: US 7,177,059 B2
• Time in Patent Office: Days
• US Class Current: 359/206
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.

Claims

1. A lithographic apparatus, comprising:

a radiation source that generates a metrology beam,

a first optical wedge,

a second optical wedge, said first and second optical wedges having a relative position with respect to each other,

wherein said at least a portion of said metrology beam propagates along an incoming optical axis at a first major surface of said first optical wedge, passes through said first and second optical wedges, and exits at a second major surface of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of a rotation and translation of said at least a portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and second optical wedges.

2. The lithographic apparatus of claim 1, wherein at least one of said first and second optical wedges are rotated over an axial angle around said optical axis.

3. The lithographic apparatus of claim 2, wherein at least one of said first and second optical wedges are displaced along said optical axis to change a distance between them.

4. The lithographic apparatus of claim 3, wherein said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around said optical axis.

5. The lithographic apparatus of claim 4, wherein said device is configured to perform a fourth operation, in which said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around a rotating axis normal to said optical axis.

6. A lithographic apparatus, comprising:

a radiation source that generates a metrology beam,

a first optical wedge,

a second optical wedge in which one of a first and second major surface of said second optical wedge is provided with a reflective coating, said first and second optical wedges having a relative position with respect to each other,

wherein said at least portion of said metrology beam propagates along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge, and reflects from said one of said first and second major surfaces of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of rotation and translation of said at least portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

7. The lithographic apparatus of claim 6, wherein at least one of said first and second optical wedges are rotated over an axial angle around said optical axis.

8. The lithographic apparatus of claim 6, wherein said second optical wedge is rotated over an angle around a rotation axis substantially perpendicular to said first major surface of said second optical wedge.

9. The lithographic apparatus of claim 8, wherein at least one of said first and second optical wedges are displaced along said optical axis to change a distance between them.

10. The lithographic apparatus of claim 9, wherein said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around said optical axis.

11. The lithographic apparatus of claim 10, wherein said first and second optical wedges have a fixed relative position with a fixed axial angle and fixed distance, and said first and second optical wedges are rotated in combination around a rotating axis normal to said optical axis.

12. A device for manipulating and routing at least one portion of a metrology beam of radiation, comprising:

a first optical wedge,

a second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other,

wherein said at least one portion of said metrology beam enters said device along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge and said second optical wedge, and exits at a second major surface of said second optical wedge, and

wherein said first and second optical wedges are configured to perform to at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

13. A device for manipulating and routing at least one portion of a metrology beam of radiation, said device comprising:

a first optical wedge,

a second optical wedge in which one of a first and second major surface of said second optical wedge is provided with a reflective coating, said second optical wedge and said first optical wedge having a relative position with respect to each other,

wherein said at least one portion of said metrology beam enters said device along an incoming optical axis at a first major surface of said first optical wedge, passes through said first optical wedge, and reflects from said one of said first and second major surfaces of said second optical wedge, and

wherein said first and second optical wedges are configured to perform at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

14. A device manufacturing method, comprising:

radiating a metrology beam, at least one portion of said metrology beam entering a first major surface of a first optical wedge along an incoming optical axis;

passing said at least one portion of said metrology beam through said first optical wedge and through a second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other;

exiting said at least one portion of said metrology beam at a second major surface of said second optical wedge; and

performing at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.

15. A device manufacturing method, comprising:

radiating a metrology beam, at least one portion of said metrology beam entering a first major surface of a first optical wedge along an incoming optical axis;

passing said at least one portion of said metrology beam through said first optical wedge;

reflecting said at least one portion of said metrology beam at one of a first and second major surface of said second optical wedge, said second optical wedge and said first optical wedge having a relative position with respect to each other; and

performing at least one of rotation and translation of said at least one portion of said metrology beam relative to said incoming optical axis by changing said relative position of said first and said second optical wedges.