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Light emitting device methods

  • US 20040259285A1
  • Filed: 03/05/2004
  • Published: 12/23/2004
  • Est. Priority Date: 04/15/2003
  • Status: Active Grant
First Claim
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1. A method of making a light-emitting device, the method comprising:

  • disposing a planarization layer on a surface of a layer of semiconductor material;

    disposing a lithography layer on a surface of the planarization layer; and

    performing nanolithography to remove at least a portion of the planarization layer, at least a portion of the lithography layer and at least a portion of the layer of semiconductor material, thereby forming a dielectric function in the surface of the layer of semiconductor material that varies spatially according to a pattern.

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