Cylindrical magnetron with self cleaning target
First Claim
Patent Images
1. A cylindrical magnetron target, comprising:
- a tube portion;
a collar portion that encircles the tube portion and that has a cylindrical inner surface that is in contact with the tube portion; and
a capturing portion that is attached to the tube portion so as to capture the collar portion in a fixed location with respect to the tube portion
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Abstract
A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the ends and any resultant arcing, resulting in a more reliable magnetron requiring less service and a magnetron that produces more consistent coatings. A low sputtering-rate collar is affixed to the target tube in the turnaround area.
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Citations
15 Claims
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1. A cylindrical magnetron target, comprising:
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a tube portion;
a collar portion that encircles the tube portion and that has a cylindrical inner surface that is in contact with the tube portion; and
a capturing portion that is attached to the tube portion so as to capture the collar portion in a fixed location with respect to the tube portion - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of forming a cylindrical target for sputtering applications, comprising:
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inserting a tube portion within a collar portion;
attaching a capturing portion to the tube portion such that the location of the collar portion is fixed with respect to the tube portion; and
subsequently forming a layer of target material on a cylindrical surface of the tube portion. - View Dependent Claims (10, 11)
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12. A target collar for attachment of a target within a coating system, comprising:
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an inner surface that defines a cylindrical opening in the target collar, the cylindrical opening having an axis; and
an outer conical surface defined by a truncated cone that shares the axis of the cylindrical opening. - View Dependent Claims (13)
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14. An endblock for holding a target tube in a cylindrical magnetron sputtering system and for transferring alternating electrical current from a source of current to the target tube, comprising:
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a central conductive portion that carries the alternating electrical current from the source of current to the target tube; and
a partial ring of conductive material that extends to partially circumscribe the central portion but does not fully circumscribe the central portion;
- View Dependent Claims (15)
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Specification