Exposure method and apparatus
First Claim
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1. An exposure apparatus comprising:
- a projection optical system for projecting a pattern on a mask onto an object to be exposed, a final surface of said projection optical system and a surface of the object being immersed in a fluid; and
a plane-parallel plate arranged between said projection optical system and the object, wherein said plane-parallel plate includes a first surface and a second surface that serves as a back surface of the first surface and opposes to the object, both the first and second surfaces being immersed in the fluid.
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Abstract
An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto an object to be exposed, a final surface of the projection optical system and a surface of the object being immersed in a fluid, and a plane-parallel plate arranged between the projection optical system and the object, wherein the plane-parallel plate includes a first surface and a second surface that serves as a back surface of the first surface and opposes to the object, both the first and second surfaces being immersed in the fluid.
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Citations
11 Claims
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1. An exposure apparatus comprising:
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a projection optical system for projecting a pattern on a mask onto an object to be exposed, a final surface of said projection optical system and a surface of the object being immersed in a fluid; and
a plane-parallel plate arranged between said projection optical system and the object, wherein said plane-parallel plate includes a first surface and a second surface that serves as a back surface of the first surface and opposes to the object, both the first and second surfaces being immersed in the fluid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 11)
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8. An exposure method for immerses, in a fluid, a surface of an object to be exposed, and a final surface of a projection optical system, and for projecting a pattern on a mask onto the object via the projection optical system, said exposure method comprising the steps of:
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immersing, in the fluid, a first surface of a plane-parallel plate arranged between the projection optical system and the object;
immersing, in the fluid, a second surface of the plane-parallel plate which serves as a back surface of the first surface and opposes to the object; and
projecting the pattern on the object via the plane-parallel plate. - View Dependent Claims (9, 10)
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Specification