Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a projection beam of radiation;
patterning means for imparting the projection beam with a pattern in its cross-section;
second patterning means for imparting a second beam of radiation supplied by the illumination system with a second pattern;
a substrate table that supports a substrate;
a projection system that projects the patterned beams onto a target portion of the substrate; and
a radiation distribution device that distributes the radiation from the illumination system to the patterning means;
wherein the radiation distribution device has a duty cycle during which it sequentially directs substantially all of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, and wherein the radiation distribution channels provide the beams of radiation to the patterning means.
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Abstract
Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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Citations
28 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a projection beam of radiation;
patterning means for imparting the projection beam with a pattern in its cross-section;
second patterning means for imparting a second beam of radiation supplied by the illumination system with a second pattern;
a substrate table that supports a substrate;
a projection system that projects the patterned beams onto a target portion of the substrate; and
a radiation distribution device that distributes the radiation from the illumination system to the patterning means;
wherein the radiation distribution device has a duty cycle during which it sequentially directs substantially all of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, and wherein the radiation distribution channels provide the beams of radiation to the patterning means. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A lithographic apparatus comprising:
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an illumination system that supplies a projection beam of radiation;
patterning means for imparting the projection beam with a pattern in its cross-section;
second patterning means for imparting a second beam of radiation supplied by the illumination system with a second pattern;
a substrate table that supports a substrate;
a projection system that projects the patterned beams onto a target portion of the substrate; and
a radiation distribution device that distributes the radiation from the illumination system to the patterning means, wherein the radiation distribution device includes a beam divider that divides the beam of radiation from the illumination system into a plurality of portions, each of which is directed to a distribution channel, and wherein the radiation distribution channels provide the beams of radiation to the patterning means and the beam divider comprises a plurality of partially reflective surfaces through which the beam of radiation from the illumination system is successively directed, each said partially reflective surface associated with one of the radiation distribution channels and reflecting a portion of the beam of radiation to said radiation distribution channel. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A device manufacturing method comprising the steps of:
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providing a projection beam of radiation using an illumination system;
using patterning means to impart the projection beam with a pattern in its cross-section;
using second patterning means to impart a second projection beam of radiation supplied by the illumination system with a second pattern in its cross-section;
projecting the patterned beams onto a target portion of a substrate; and
using a radiation distribution device to distribute the radiation from the illumination system to the patterning means, wherein the radiation distribution device has a duty cycle during which it sequentially directs substantially all of the radiation from the illumination system to each of a plurality of radiation distribution channels in turn, wherein the radiation distribution channels provide the beams of radiation to the patterning means.
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Specification