Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film

• US 20050245097A1
• Filed: 07/11/2005
• Published: 11/03/2005
• Est. Priority Date: 04/08/2002
• Status: Active Grant

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Aoi, Nobuo
• Granted Patent: US 7,396,778 B2
• Time in Patent Office: Days
• US Class Current: 438/780
• CPC Class Codes: C08G 73/10 Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
• CPC Class Codes: C08J 5/18 Manufacture of films or sheets
• CPC Class Codes: H01L 21/02118 carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC polymers per se C08G, photoresist per se G03F
• CPC Class Codes: H01L 21/02203 the layer being porous
• CPC Class Codes: H01L 21/312 Organic layers, e.g. photoresist H01L21/3105, H01L21/32 take precedence; photoresists per se G03C

Abstract

A Lewis acid-base reaction is caused, in a solution, between a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base, so as to generate a monomer adduct in which the first monomer and the second monomer are bonded to each other through weak electric interaction. Next, the solution including the monomer adduct is applied on a substrate so as to form a supramolecular solid thin film made of the monomer adduct. Then, the supramolecular solid thin film is heated so as to cause a polymerization reaction between the first monomer and the second monomer within the supramolecular solid thin film, thereby forming a polymer thin film.

Claims

1. A method for synthesizing a polymeric material comprising the steps of:

forming a supramolecular structure by allowing a Lewis acid and a Lewis base in a solution state to self-organize through acid-base interaction; and

generating a polymer three-dimensional structure by polymerizing said Lewis acid and said Lewis base included in said supramolecular structure with said supramolecular structure used as a polymerization reaction field.

2. The method for synthesizing a polymeric material of claim 1,

wherein said polymer three-dimensional structure is a thin film including a large number of fine pores arranged at high regularity therein.

3. A method for synthesizing a polymeric material comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

generating a supramolecular solid made of said monomer adduct by evaporating a solvent from said solution including said monomer adduct; and

generating a polymer solid by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid.

4. The method for synthesizing a polymeric material of claim 3,

wherein said Lewis acid is a carboxylic acid derivative, an alcohol derivative, a ketone derivative, an aldehyde derivative or an acid anhydride derivative, and

said Lewis base is an amine derivative.

5. The method for synthesizing a polymeric material of claim 3,

wherein said Lewis acid is an adamantane derivative having a carboxyl group, and

said Lewis base is a tetraaminobenzidine derivative having an amino group, a tetraaminobenzene derivative having an amino group or a diaminodihydroxylbenzene derivative having an amino group.

6. The method for synthesizing a polymeric material of claim 5,

wherein said adamantane derivative having a carboxyl group is a I -carboxyladamantane derivative, a 1,3-dicarboxyladamantane derivative, a 1,3,5-tricarboxyladamantane derivative, a 1,3,5,7-tetracarboxyladamantane derivative or a mixture of any of said derivatives.

7. The method for synthesizing a polymeric material of claim 3,

wherein said Lewis acid is a benzene derivative having a carboxyl group, a benzidine derivative having a carboxyl group, a naphthalene derivative having a carboxyl group, an anthracene derivative having a carboxyl group or a tetracene derivative having a carboxyl group, and

said Lewis base is an adamantane derivative having an amino group.

8. The method for synthesizing a polymeric material of claim 7,

wherein said adamantane derivative having an amino group is a 1-aminoadamantane derivative, a 1,3-diaminoadamantane derivative, a 1,3,5-triaminoadamantane derivative, a 1,3,5,7-tetraamine derivative or a mixture of any of said derivatives.

9. The method for synthesizing a polymeric material of claim 3,

wherein at least one of said first monomer and said second monomer has a flexible bond.

10. The method for synthesizing a polymeric material of claim 9, wherein said flexible bond is formed by a methylene group.

11. A method for forming a polymer thin film comprising the steps of:

generating a monomer adduct in which a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base are bonded to each other through weak electric interaction by causing a Lewis acid-base reaction between said first monomer and said second monomer in a solution;

forming a supramolecular solid thin film made of said monomer adduct by applying said solution including said monomer adduct on a substrate; and

forming a polymer thin film by causing a polymerization reaction between said first monomer and said second monomer within said supramolecular solid thin film by heating said supramolecular solid thin film.

12. The method for forming a polymer thin film of claim 11,

wherein said Lewis acid is a carboxylic acid derivative, an alcohol derivative, a ketone derivative, an aldehyde derivative or an acid anhydride derivative, and

said Lewis base is an amine derivative.

13. The method for forming a polymer thin film of claim 11,

wherein said Lewis acid is an adamantane derivative having a carboxyl group, and

said Lewis base is a tetraaminobenzidine derivative having an amino group, a tetraaminobenzene derivative having an amino group or a diaminodihydroxylbenzene derivative having an amino group.

14. The method for forming a polymer thin film of claim 13,

wherein said adamantane derivative having a carboxyl group is a 1-carboxyladamantane derivative, a 1,3-dicarboxyladamantane derivative, a 1,3,5-tricarboxyladamantane derivative, a 1,3,5,7-tetracarboxyladamantane derivative or a mixture of any of said derivatives.

15. The method for forming a polymer thin film of claim 11,

wherein said Lewis acid is a benzene derivative having a carboxyl group, a benzidine derivative having a carboxyl group, a naphthalene derivative having a carboxyl group, an anthracene derivative having a carboxyl group or a tetracene derivative having a carboxyl group, and

said Lewis base is an adamantane derivative having an amino group.

16. The method for forming a polymer thin film of claim 15,

wherein said adamantane derivative having an amino group is a 1-aminoadamantane derivative, a 1,3-diaminoadamantane derivative, a 1,3,5-triaminoadamantane derivative, a 1,3,5,7-tetraamine derivative or a mixture of any of said derivatives.

17. The method for forming a polymer thin film of claim 11,

wherein at least one of said first monomer and said second monomer has a flexible bond.

18. The method for forming a polymer thin film of claim 17,

wherein said flexible bond is formed by a methylene group.

19-26. -26. (canceled)