Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto the substrate;
a liquid supply system configured to supply liquid to a space between the projection system and the substrate; and
a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
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Abstract
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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Citations
20 Claims
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1. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto the substrate;
a liquid supply system configured to supply liquid to a space between the projection system and the substrate; and
a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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- 11. A device manufacturing method comprising projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
Specification