Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
an array of individually controllable elements that modulate the radiation beam;
a projection system that projects the modulated beam onto a target portion of a substrate; and
a pattern controller that provides control signals to the array of individually controllable elements, such that the radiation beam is modulated to generate a desired pattern and dose profile on the substrate, wherein the pattern controller comprises a pattern adjuster that adjusts at least one of a size and a position, relative to the substrate, of at least a part of the pattern generated on the substrate by adjusting radiation intensity of at least a part of the modulated beam.
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Abstract
A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
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Citations
19 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that conditions a radiation beam;
an array of individually controllable elements that modulate the radiation beam;
a projection system that projects the modulated beam onto a target portion of a substrate; and
a pattern controller that provides control signals to the array of individually controllable elements, such that the radiation beam is modulated to generate a desired pattern and dose profile on the substrate, wherein the pattern controller comprises a pattern adjuster that adjusts at least one of a size and a position, relative to the substrate, of at least a part of the pattern generated on the substrate by adjusting radiation intensity of at least a part of the modulated beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A device manufacturing method, comprising:
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projecting a beam of radiation that is modulated by an array of individually controllable elements onto a substrate;
providing control signals to the array of individually controllable elements, such that the radiation beam is modulated to generate a desired pattern and dose profile on the substrate; and
adjusting at least one of a size and a position, relative to the substrate, of at least a part of the pattern generated on the substrate by adjusting an intensity of at least a part of the modulated beam. - View Dependent Claims (18, 19)
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Specification