Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
First Claim
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1. An apparatus for developing a lithographic mask layout, the lithographic mask layout being adapted for configuring an array of micro-mirrors in a maskless lithography system, the apparatus comprising:
- means for generating an ideal mask layout representative of image characteristics associated with a desired image; and
means for producing an equivalent mask layout in accordance with an average intensity of the ideal mask layout.
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Abstract
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.
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Citations
14 Claims
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1. An apparatus for developing a lithographic mask layout, the lithographic mask layout being adapted for configuring an array of micro-mirrors in a maskless lithography system, the apparatus comprising:
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means for generating an ideal mask layout representative of image characteristics associated with a desired image; and
means for producing an equivalent mask layout in accordance with an average intensity of the ideal mask layout. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification