MULTI-ZONE GAS DISTRIBUTION SYSTEM FOR A TREATMENT SYSTEM
First Claim
1. A treatment system comprising:
- a process chamber, including a process space;
a radical generation system coupled to said process chamber and configured to receive process gas and produce radicals from said process gas;
a gas distribution system and configured to receive and distribute a flow of said radicals within said process space, wherein said gas distribution system comprises an inlet coupled to an exit of said radical generation system, an outlet coupled to said process chamber, and a dividing member coupled to the gas distribution system and configured to separately divert a portion of the flow of said process gas through said inlet to a first region above said substrate, and separately divert the remaining portion of the flow of said process gas through said inlet to a second region above said substrate;
a pedestal coupled to said process chamber and configured to support a substrate in said process space of the process chamber and adjust the temperature of said substrate; and
a vacuum pumping system coupled to said process chamber and configured to evacuate said process chamber.
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Accused Products
Abstract
A treatment system is described for exposing a substrate to various processes. Additionally, a gas distribution system is configured to be coupled to and utilized with the treatment system in order to distribute process material above the substrate is provided. The treatment system includes a process chamber, a radical generation system coupled to the process chamber, a gas distribution system coupled to the radical generation system and configured to distribute reactive radicals above a substrate, and a temperature controlled pedestal coupled to the vacuum chamber and configured to support the substrate. The gas distribution system is configured to efficiently transport radicals to the substrate and distribute the radicals above the substrate.
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Citations
25 Claims
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1. A treatment system comprising:
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a process chamber, including a process space; a radical generation system coupled to said process chamber and configured to receive process gas and produce radicals from said process gas; a gas distribution system and configured to receive and distribute a flow of said radicals within said process space, wherein said gas distribution system comprises an inlet coupled to an exit of said radical generation system, an outlet coupled to said process chamber, and a dividing member coupled to the gas distribution system and configured to separately divert a portion of the flow of said process gas through said inlet to a first region above said substrate, and separately divert the remaining portion of the flow of said process gas through said inlet to a second region above said substrate; a pedestal coupled to said process chamber and configured to support a substrate in said process space of the process chamber and adjust the temperature of said substrate; and a vacuum pumping system coupled to said process chamber and configured to evacuate said process chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A gas distribution system configured to be coupled to a substrate processing system, comprising:
a main body having an inlet configured to receive a flow of process gas, an outlet configured to distribute said process gas in said processing system, and a dividing member coupled to said gas distribution system and configured to separately divert a portion of the flow of said process gas through said inlet to a first region above said substrate, and separately divert the remaining portion of the flow of said process gas through said inlet to a second region above said substrate. - View Dependent Claims (20, 21, 22, 23, 24)
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25. A treatment system comprising:
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a process chamber including a process space; means for generating radicals from the process gas remotely from said process space; means for delivering said radicals to the process space with substantially uniform distribution across a surface of a substrate provided in the process space; a pedestal coupled to said process chamber and configured to support a substrate in the process chamber and adjust a temperature of the substrate; and a vacuum pumping system coupled to said process chamber and configured to evacuate said process chamber.
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Specification