METHOD FOR PREPARING TRANSPARENT CONDUCTING FILM COATED WITH AZO/AG/AZO MULTILAYER THIN FILM
First Claim
1. A method for preparing a transparent conducting film coated with an AZO/Ag/AZO multilayer thin film, the method comprising:
- forming a primary AZO thin film on a substrate using an AZO target doped with Al through a sputtering method;
depositing Ag on the primary AZO thin film using the sputtering method to form a deposited Ag layer; and
forming a secondary AZO thin film on the Ag thin film using the AZO target doped with Al through the sputtering method.
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Abstract
A method for preparing a transparent conducting film coated with an AZO/Ag/AZO multilayer thin film with low resistivity and high light transmittance, and a transparent conducting film produced by the same method. The method for preparing a transparent conducting film coated with an AZO/Ag/AZO multilayer thin film, includes (a) forming a primary AZO thin film on a substrate using an AZO target doped with Al through a sputtering method; (b) depositing Ag on the primary AZO thin film using the sputtering method to form a deposited Ag layer; and (c) forming a secondary AZO thin film on the Ag thin film using the AZO target doped with Al through a sputtering method.
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Citations
15 Claims
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1. A method for preparing a transparent conducting film coated with an AZO/Ag/AZO multilayer thin film, the method comprising:
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forming a primary AZO thin film on a substrate using an AZO target doped with Al through a sputtering method; depositing Ag on the primary AZO thin film using the sputtering method to form a deposited Ag layer; and forming a secondary AZO thin film on the Ag thin film using the AZO target doped with Al through the sputtering method. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification