THIN FILM DEPOSITION APPARATUS

• US 20100297348A1
• Filed: 05/21/2010
• Published: 11/25/2010
• Est. Priority Date: 05/22/2009
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Mobile Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: LEE, Choong-Ho, LEE, Jung-Min
• Granted Patent: US 8,916,237 B2
• Time in Patent Office: Days
• US Class Current: 427/248.1
• CPC Class Codes: C23C 14/24 Vacuum evaporation

Abstract

A thin film deposition apparatus that can be simply applied to manufacture large-sized display devices on a mass scale and that improves manufacturing yield includes: a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; and an alignment member including an interval control member that adjusts an interval between the second nozzle and the substrate, and/or an alignment control member that adjusts alignment between the second nozzle and the substrate.

Claims

1. A thin film deposition apparatus for forming a thin film on a substrate, the apparatus comprising:

a deposition source;

a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction;

a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction;

a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; and

an adjusting member comprising an interval control member that adjusts an interval between the second nozzle and the substrate, and/or an alignment control member that adjusts an alignment between the second nozzle and the substrate.

2. The thin film deposition apparatus of claim 1, wherein the adjusting member comprises the interval control member which adjusts the interval between the second nozzle and the substrate to be constant.

3. The thin film deposition apparatus of claim 1, wherein the adjusting member comprises the interval control member and the interval control member comprises:

a sensor that senses a position of the second nozzle above the substrate; and

an actuator that provides a driving force to move the second nozzle relative to the substrate to adjust the interval according to the sensed position.

4. The thin film deposition apparatus of claim 3, wherein the substrate comprises a positioning mark, and the sensor senses the position of the second nozzle above the substrate based on the positioning mark.

5. The thin film deposition apparatus of claim 4, further comprising an open mask which is arranged on the substrate not to overlap with the positioning mask.

6. The thin film deposition apparatus of claim 3, further comprising:

a base frame; and

a tray that is arranged on the base frame and accommodates the second nozzle therein.

7. The thin film deposition apparatus of claim 6, wherein the actuator adjusts the interval between the second nozzle and the substrate by moving the second nozzle relative to the tray.

8. The thin film deposition apparatus of claim 6, wherein the interval control member comprises:

a first actuator that is disposed between a side of the second nozzle and the tray to move the second nozzle relative to the tray;

a second actuator that is disposed between a side of the second nozzle opposite to the side of the second nozzle on which the first actuator is disposed and the tray to move the second nozzle relative to the tray; and

a third actuator that rotates the second nozzle with respect to an axis parallel to the first direction.

9. The thin film deposition apparatus of claim 3, wherein the actuator comprises a piezoelectric motor.

10. The thin film deposition apparatus of claim 3, wherein the actuator and the sensor adjust the interval between the second nozzle and the substrate by real-time feedback control.

11. The thin film deposition apparatus of claim 1, wherein the adjusting member comprises the interval control member and the interval control member comprises rollers and/or balls that are disposed at opposite end portions of the second nozzle and contact the substrate.

12. The thin film deposition apparatus of claim 1, wherein the adjusting member comprises the alignment control member and the alignment control member adjusts a position of the second nozzle relative to the substrate to be constant.

13. The thin film deposition apparatus of claim 1, wherein the adjusting member comprises the alignment control member and the alignment control member comprises:

a sensor that senses a position of the second nozzle relative to the substrate; and

an actuator that provides a driving force to move the second nozzle relative to the substrate to adjust the alignment according to the sensed position.

14. The thin film deposition apparatus of claim 13, wherein the substrate comprises a positioning mark, and the sensor senses the position of the second nozzle relative to the substrate based on the positioning mark.

15. The thin film deposition apparatus of claim 14, further comprising an open mask which is arranged on the substrate not to overlap with the positioning mask.

16. The thin film deposition apparatus of claim 13, further comprising:

a base frame; and

a tray that is arranged on the base frame and accommodates the second nozzle therein.

17. The thin film deposition apparatus of claim 16, wherein the actuator adjusts the alignment between the second nozzle and the substrate by moving the second nozzle relative to the tray.

18. The thin film deposition apparatus of claim 16, wherein:

the actuator is disposed between a first side of the tray and the base frame to linearly move the tray relative to the base frame; and

the alignment control member further comprises another actuator that is disposed between a side of the tray adjacent to the first side and the base frame to rotatably move the tray relative to the base frame.

19. The thin film deposition apparatus of claim 13, wherein the actuator comprises a piezoelectric motor.

20. The thin film deposition apparatus of claim 13, wherein the actuator and the sensor adjust the alignment between the second nozzle and the substrate by real-time feedback control.

21. The thin film deposition apparatus of claim 1, wherein each of the barrier walls extends in a second direction that is substantially perpendicular to the first direction, in order to partition the space between the first nozzle and the second nozzle.

22. The thin film deposition apparatus of claim 1, wherein the plurality of barrier walls are arranged at equal intervals in the first direction.

23. The thin film deposition apparatus of claim 1, wherein the barrier walls are separated from the second nozzle by a predetermined distance.

24. The thin film deposition apparatus of claim 1, wherein the barrier wall assembly is detachable from the thin film deposition apparatus.

25. The thin film deposition apparatus of claim 1, wherein the barrier wall assembly comprises a first barrier wall assembly comprising a plurality of first barrier walls, and a second barrier wall assembly comprising a plurality of second barrier walls.

26. The thin film deposition apparatus of claim 25, wherein each of the first barrier walls and each of the second barrier walls extend in a second direction that is substantially perpendicular to the first direction, in order to partition the space between the first nozzle and the second nozzle.

27. The thin film deposition apparatus of claim 25, wherein the first barrier walls are arranged to correspond to the second barrier walls.

28. The thin film deposition apparatus of claim 27, wherein each pair of the corresponding first and second barrier walls is arranged on substantially the same plane.

29. The thin film deposition apparatus of claim 1, wherein a deposition material vaporized in the deposition source is deposited on the substrate by being discharged through the first nozzle and the second nozzle.

30. The thin film deposition apparatus of claim 1, wherein the second nozzle is separated from the substrate by a predetermined distance.

31. The thin film deposition apparatus of claim 1, wherein the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly are movable relative to the substrate, or the substrate is movable relative to the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly.

32. The thin film deposition apparatus of claim 31, wherein a deposition material vaporized in the deposition source is deposited on the substrate while the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly are moved relative to the substrate or while the substrate is moved relative to the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly.

33. The thin film deposition apparatus of claim 31, wherein the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly are moved relative to the substrate along a plane parallel to a surface of the substrate, or the substrate is moved relative to the deposition source, the first nozzle, the second nozzle, and the barrier wall assembly along the plane.

34. A thin film deposition apparatus for forming a thin film on a substrate, the apparatus comprising:

a deposition source that discharges a deposition material;

a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction;

a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in a second direction perpendicular to the first direction; and

an adjusting member comprising an interval control member that adjusts an interval between the second nozzle and the substrate, and/or an alignment control member that adjusts an alignment between the second nozzle and the substrate,

wherein;

a deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and

the deposition source, the first nozzle and the second nozzle are integrally formed as one body.

35. The thin film deposition apparatus of claim 34, wherein the adjusting member comprises the interval control member which adjusts the interval between the second nozzle and the substrate to be constant.

36. The thin film deposition apparatus of claim 34, wherein the adjusting member comprises the interval control member and the interval control member comprises:

a sensor that senses a position of the second nozzle above the substrate; and

an actuator that provides a driving force to move the second nozzle above the substrate to adjust the interval according to the sensed position.

37. The thin film deposition apparatus of claim 36, wherein the substrate comprises a positioning mark, and the sensor senses the position of the second nozzle above the substrate based on the positioning mark.

38. The thin film deposition apparatus of claim 37, further comprising an open mask arranged on the substrate not to overlap with the positioning mask.

39. The thin film deposition apparatus of claim 36, further comprising:

a base frame; and

a tray that is arranged on the base frame and accommodates the second nozzle therein.

40. The thin film deposition apparatus of claim 39, wherein the actuator adjusts the interval between the second nozzle and the substrate by moving the second nozzle relative to the tray.

41. The thin film deposition apparatus of claim 39, wherein the interval control member comprises:

a first actuator that is disposed between a side of the second nozzle and the tray to move the second nozzle relative to the tray;

a second actuator that is disposed between a side of the second nozzle opposite to the side of the second nozzle on which the first actuator is disposed and the tray to move the second nozzle relative to the tray; and

a third actuator that rotates the second nozzle with respect to an axis parallel to the first direction.

42. The thin film deposition apparatus of claim 36, wherein the actuator comprises a piezoelectric motor.

43. The thin film deposition apparatus of claim 36, wherein the actuator and the sensor adjust the interval between the second nozzle and the substrate by real-time feedback control.

44. The thin film deposition apparatus of claim 34, wherein the adjusting member comprises the interval control member and the interval control member comprises rollers or balls that are disposed at opposite end portions of the second nozzle and contact the substrate.

45. The thin film deposition apparatus of claim 34, wherein the adjusting member comprises the alignment control member which adjusts a position of the second nozzle relative to the substrate to be constant.

46. The thin film deposition apparatus of claim 34, wherein the adjusting member comprises the alignment control member and the alignment control member comprises:

a sensor that senses a position of the second nozzle relative to the substrate; and

an actuator that provides a driving force to move the second nozzle relative to the substrate to adjust the alignment according to the sensed position.

47. The thin film deposition apparatus of claim 46, wherein the substrate comprises a positioning mark, and the sensor senses the position of the second nozzle relative to the substrate based on the positioning mark.

48. The thin film deposition apparatus of claim 47, further comprising an open mask that is arranged on the substrate not to overlap with the positioning mask.

49. The thin film deposition apparatus of claim 46, further comprising:

a base frame; and

a tray that is arranged on the base frame and accommodates the second nozzle therein.

50. The thin film deposition apparatus of claim 49, wherein the actuator adjusts the alignment between the second nozzle and the substrate by moving the second nozzle relative to the tray.

51. The thin film deposition apparatus of claim 49, wherein:

the actuator is disposed between a first side of the tray and the base frame to linearly move the tray relative to the base frame; and

the alignment control member further comprises another actuator that is disposed between a side of the tray adjacent to the first side and the base frame to rotatably move the tray relative to the base frame.

52. The thin film deposition apparatus of claim 46, wherein the actuator comprises a piezoelectric motor.

53. The thin film deposition apparatus of claim 46, wherein the actuator and the sensor adjust the alignment between the second nozzle and the substrate by real-time feedback control.

54. The thin film deposition apparatus of claim 34, further comprising a connection member which integrally connects the deposition source, the first nozzle and the second nozzle as the one body.

55. The thin film deposition apparatus of claim 54, wherein the connection member guides a flow of the deposition material from the deposition source, through the first and second nozzles, to the substrate.

56. The thin film deposition apparatus of claim 54, wherein the connection member seals a space between the deposition source, the first nozzle, and the second nozzle.

57. The thin film deposition apparatus of claim 34, wherein the thin film deposition apparatus is separated from the substrate by a predetermined distance.

58. The thin film deposition apparatus of claim 34, wherein the deposition material discharged from the thin film deposition apparatus is continuously deposited on the substrate while one of the substrate or the thin film deposition apparatus is moved relative to the other one of the substrate and the thin film deposition apparatus in the first direction.

59. The thin film deposition apparatus of claim 34, wherein the second nozzle is smaller than the substrate.

60. The thin film deposition apparatus of claim 34, wherein the plurality of first slits are tilted at a predetermined angle.

61. The thin film deposition apparatus of claim 60, wherein the plurality of first slits comprise first slits that are arranged in two rows along the first direction and the first slits in each row tilt towards the first slits in the other row.

62. The thin film deposition apparatus of claim 60, wherein:

the plurality of first slits comprise first slits that are arranged in two rows along the first direction;

the first slits of a first one of the two rows, are arranged to face an end portion of the second nozzle opposite to a second row of the first slits; and

the first slits of the second row are arranged to face an end portion of the second nozzle opposite to the first row of the first slits.

63. A thin film deposition apparatus for forming a thin film on a substrate, the apparatus comprising:

a deposition source housing a deposition material;

a first nozzle including a plurality of first slits arranged in a first direction and through which the deposition material passes from the deposition source;

a second nozzle disposed such that the first nozzle is between the second nozzle and the deposition source, the second nozzle including a plurality of second slits arranged in the first direction and through which the deposition material passes after passing through the first nozzle; and

an adjustment control unit comprising an actuator set which adjusts an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited.

64. The thin film deposition apparatus of claim 63, wherein the adjustment control unit further comprises a sensor set which detects the orientation, and controls the actuator set to adjust the orientation needed to deposit the deposition material on the deposition target area.

65. The thin film deposition apparatus of claim 63, wherein the adjustment control unit controls the actuator set to adjust a distance between the substrate and the second nozzle.

66. The thin film deposition apparatus of claim 63, wherein the adjustment control unit controls the actuator set to adjust a position of the second nozzle relative to the deposition target area by moving the second nozzle in a plane substantially parallel to a surface of the deposition target area.

67. The thin film deposition apparatus of claim 66, wherein the adjustment control unit further controls the actuator set to adjust a distance between the substrate and the second nozzle.

68. The thin film deposition apparatus of claim 63, further comprising a frame which holds the second nozzle, wherein the actuator set is disposed between the second nozzle and the frame.

69. The thin film deposition apparatus of claim 63, further comprising a frame which holds the second nozzle, wherein the actuator set is disposed between the substrate and the frame and adjusts a distance between the second nozzle and the substrate.

70. The thin film deposition apparatus of claim 69, further comprising another actuator set disposed between the second nozzle and the frame and which adjusts a position of the second nozzle relative to the deposition target area by moving the second nozzle in a plane substantially parallel to a surface of the deposition target area.

71. The thin film deposition apparatus of claim 70, wherein the adjustment control unit further comprises a sensor set which detects the orientation, and controls the actuator set to adjust the orientation needed to deposit the deposition material on the deposition target area.

72. The thin film deposition apparatus of claim 71, further comprising a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle;

73. The thin film deposition apparatus of claim 71, further comprising a connector wall assembly which connects the first nozzle and the second nozzle to form an integrated single body.

74. A method of manufacturing a thin film on a substrate comprising:

passing vaporized deposition material through first slits of a first nozzle, the first slits being arranged in a first direction;

passing the vaporized deposition material received from the first slits through second slits of a second nozzle, the second slits being arranged in the first direction;

using an adjustment control unit comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited; and

depositing the deposition material from the second nozzle onto the deposition target area.

75. The method of claim 74, wherein:

the depositing further comprising creating relative motion between the second nozzle and the substrate to perform the deposition, and

the second nozzle is smaller than the deposition target area.

76. The method of claim 74, further comprising sensing a relative position of the second nozzle relative to the deposition target area, wherein the using adjustment control unit comprises adjusting the orientation of the second nozzle relative to the deposition target area according to the sensed relative position.

77. The method of claim 76, wherein the using the adjustment control unit comprises controlling the actuator set to adjust a position of the second nozzle relative to the deposition target area by moving the second nozzle in a plane substantially parallel to a surface of the deposition target area and/or to adjust a distance between the substrate and the second nozzle.