OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
First Claim
Patent Images
1. A method of manufacturing an array of elongated microlenses configured to be used in an illumination system of a microlithographic projection exposure apparatus, the method comprising:
- a) repeatedly moving a cutting tool comprising a cutting edge relative to a substrate in a fly-cut process so that the cutting edge cuts into the substrate; and
b) moving the substrate during step a) along a longitudinal direction;
c) moving the substrate at least substantially perpendicular to the longitudinal direction; and
d) repeating a) and b) to provide the array of elongated microlenses,wherein the elongated microlenses have longitudinal axes which are parallel to the longitudinal direction.
2 Assignments
0 Petitions
Accused Products
Abstract
The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
-
Citations
33 Claims
-
1. A method of manufacturing an array of elongated microlenses configured to be used in an illumination system of a microlithographic projection exposure apparatus, the method comprising:
-
a) repeatedly moving a cutting tool comprising a cutting edge relative to a substrate in a fly-cut process so that the cutting edge cuts into the substrate; and b) moving the substrate during step a) along a longitudinal direction; c) moving the substrate at least substantially perpendicular to the longitudinal direction; and d) repeating a) and b) to provide the array of elongated microlenses, wherein the elongated microlenses have longitudinal axes which are parallel to the longitudinal direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
-
-
32. A method of reworking an array of elongated microlenses having a maximum pitch, the array of elongated microlenses being configured for use in an illumination system of a microlithographic projection exposure apparatus, the method comprising:
exposing a portion of an elongated microlens to an ion beam having a cross section with a maximum dimension greater than a maximum pitch of the portion of the elongated microlens. - View Dependent Claims (33)
Specification