METHOD FOR BONDING A TANTALUM STRUCTURE TO A COBALT-ALLOY SUBSTRATE
1 Assignment
0 Petitions
Accused Products
Abstract
A method for bonding a porous tantalum structure to a substrate is provided. The method comprises providing a substrate comprising cobalt or a cobalt-chromium alloy; an interlayer consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titanium, or alloys or combinations thereof; and a porous tantalum structure. Heat and pressure are applied to the substrate, the interlayer, and the porous tantalum structure to achieve solid-state diffusion between the substrate and the interlayer and between the interlayer and the porous tantalum structure.
-
Citations
45 Claims
-
1-25. -25. (canceled)
-
26. A method for bonding a porous tantalum structure to a substrate, comprising:
-
providing a substrate comprising cobalt or a cobalt-chromium alloy; providing a porous tantalum structure; applying an interlayer consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titanium, or alloys or combinations thereof to a surface of one of the porous tantalum structure and the substrate, wherein the interlayer is applied to the surface by at least one of thermal spraying, plasma spraying, electron beam deposition, laser deposition, chemical vapor deposition, electrodeposition, or cold spray coating; positioning the other of the porous tantalum structure and the substrate in contact with the interlayer thereby forming an assembly, wherein with the interlayer is between the substrate and the porous tantalum structure; and applying heat and pressure to the assembly for a time sufficient to achieve solid-state diffusion between the substrate and the interlayer and solid-state diffusion between the interlayer and the porous tantalum structure. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34)
-
-
35. A method for bonding a porous tantalum structure to a substrate, comprising:
-
providing a substrate comprising cobalt or a cobalt-chromium alloy; applying an interlayer consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titanium, or alloys or combinations thereof to a surface of the substrate, wherein the interlayer is applied to the surface by at least one of thermal spraying, plasma spraying, electron beam deposition, laser deposition, chemical vapor deposition, electrodeposition, or cold spray coating; applying heat and pressure to the interlayer and the substrate for a time sufficient to achieve solid-state diffusion between the substrate and the interlayer thereby forming a subassembly; positioning a porous tantalum structure in contact with the interlayer portion of the subassembly thereby forming an assembly; and applying heat and pressure to the assembly for a time sufficient to achieve solid-state diffusion between the interlayer and the porous tantalum structure. - View Dependent Claims (36, 37, 38)
-
-
39. A method for bonding a porous tantalum structure to a substrate, comprising:
-
providing a porous tantalum structure; applying an interlayer consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titanium, or alloys or combinations thereof to a surface of the porous tantalum structure wherein the interlayer is applied to the surface by at least one of thermal spraying, plasma spraying, electron beam deposition, laser deposition, chemical vapor deposition, electrodeposition, or cold spray coating; applying heat and pressure to the interlayer and the porous tantalum structure for a time sufficient to achieve solid-state diffusion between the porous tantalum structure and the interlayer thereby forming a subassembly; positioning a substrate comprising cobalt or a cobalt-chromium alloy in contact with the interlayer portion of the subassembly thereby forming an assembly; and applying heat and pressure to the assembly for a time sufficient to achieve solid-state diffusion between the interlayer and the substrate. - View Dependent Claims (40, 41, 43, 44, 45)
-
Specification