RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUCTIVELY COUPLED PLASMA ION SOURCE
First Claim
1. A plasma source for processing or imaging a substrate, secondary ion mass spectrometry, ion source for proton therapy, and high energy particle accelerators comprising:
- a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage;
a gas source coupled to the reactor chamber to provide gas into the reaction chamber;
an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber;
a first source of radio frequency power with tunable radio frequency;
a plurality of induction coils adjacent to the reactor chamber and coupled to said first source of radio frequency power to inductively couple power into the plasma from said first source of radio frequency power through a impedance matching network composed of capacitors with fixed capacitance,wherein the frequency of the power is adjusted to allow efficient power coupling between the source of radio frequency power and the plasma source.
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Accused Products
Abstract
In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.
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Citations
16 Claims
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1. A plasma source for processing or imaging a substrate, secondary ion mass spectrometry, ion source for proton therapy, and high energy particle accelerators comprising:
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a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; a first source of radio frequency power with tunable radio frequency; a plurality of induction coils adjacent to the reactor chamber and coupled to said first source of radio frequency power to inductively couple power into the plasma from said first source of radio frequency power through a impedance matching network composed of capacitors with fixed capacitance, wherein the frequency of the power is adjusted to allow efficient power coupling between the source of radio frequency power and the plasma source. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A plasma source for processing or imaging a substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators comprising:
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a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; and a magnetic circuit with one portion of the circuit containing a high magnetic permeability material, the one portion being biased to high voltage and electrically isolated from another portion of the magnetic circuit by a dielectric fluid. - View Dependent Claims (8, 9, 10)
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11. A plasma source for processing or imaging a substrate, ion source for proton therapy, secondary ion mass spectrometry, ion thrusters, and high energy particle accelerators comprising:
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a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; a transverse magnetic field applied at or near the exit aperture; a first source of radio frequency power with frequency above 40 Mhz; and a plurality of induction coils adjacent to the reactor chamber and coupled to said first source of radio frequency power to inductively couple power into the plasma from said first source of radio frequency power.
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12. A plasma source for processing or imaging a substrate, ion source for proton therapy, ion thrusters, and high energy particle accelerators comprising:
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a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; and an insulator made up of a capillary or tube with an inner diameter much smaller than its length, where the insulator has a spiral, serpentine, or coiled path to reduce the electric field along the tube or capillary length. - View Dependent Claims (13, 14, 15, 16)
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Specification