INTEGRATED USE OF MODEL-BASED METROLOGY AND A PROCESS MODEL
First Claim
1. A method comprising:
- receiving an amount of measurement data associated with measurements of a target structure by a metrology tool;
determining a set of parameter values characterizing the target structure based on a fitting of the amount of measurement data to an integrated measurement model of the target structure, wherein the integrated measurement model is based on a process based target model and a metrology based target model; and
storing the set of parameter values in a memory.
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Abstract
Methods and systems for performing measurements based on a measurement model integrating a metrology-based target model with a process-based target model. Systems employing integrated measurement models may be used to measure structural and material characteristics of one or more targets and may also be used to measure process parameter values. A process-based target model may be integrated with a metrology-based target model in a number of different ways. In some examples, constraints on ranges of values of metrology model parameters are determined based on the process-based target model. In some other examples, the integrated measurement model includes the metrology-based target model constrained by the process-based target model. In some other examples, one or more metrology model parameters are expressed in terms of other metrology model parameters based on the process model. In some other examples, process parameters are substituted into the metrology model.
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Citations
31 Claims
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1. A method comprising:
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receiving an amount of measurement data associated with measurements of a target structure by a metrology tool; determining a set of parameter values characterizing the target structure based on a fitting of the amount of measurement data to an integrated measurement model of the target structure, wherein the integrated measurement model is based on a process based target model and a metrology based target model; and storing the set of parameter values in a memory. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method comprising:
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receiving an amount of measurement data associated with measurements of a target structure by a metrology tool; determining one or more process parameter values characterizing a process employed to generate the target structure based on the amount of measurement data and an integrated measurement model of the target structure; and storing the one or more process parameter values in a memory. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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21. A system comprising:
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an optical metrology tool including an illumination source and a detector configured to perform measurements of a target structure; and a computing system configured to; receive an amount of measurement data associated with measurements of a target structure by the metrology tool; determine a set of parameter values characterizing the target structure based on a fitting of the amount of measurement data to an integrated measurement model of the target structure, wherein the integrated measurement model is based on a process based target model and a metrology based target model; and store the set of parameter values in a memory. - View Dependent Claims (22, 23, 24, 25, 26, 27)
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28. A system comprising:
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a metrology tool including an illumination source and a detector configured to perform measurements of a target structure; and a computing system configured to; receive an amount of measurement data associated with measurements of a target structure by the metrology tool; determine one or more process parameter values characterizing a process employed to generate the target structure based on the amount of measurement data and an integrated measurement model of the target structure; and store the one or more process parameter values in a memory. - View Dependent Claims (29, 30, 31)
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Specification