METHOD OF DESIGNING LAYOUT OF INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT
First Claim
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1. A method of designing a layout of an integrated chip (IC), the method comprising:
- designing a first layout by placing and routing a plurality of standard cells that define the IC; and
generating a second layout by modifying the first layout during a mask data preparation process related to the first layout, wherein the second layout is generated by connecting first and second patterns from among first layer patterns corresponding to a first layer of the first layout, such that the number of masks necessary for forming the first layer patterns is reduced.
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Abstract
A method of designing a layout of an integrated chip (IC) includes designing a first layout by place and route a plurality of standard cells that define the IC, and generating a second layout by modifying the first layout during a mask data preparation process related to the first layout, wherein the second layout is generated by connecting first and second patterns from among first layer patterns that correspond to a first layer of the first layout, such that the number of masks necessary for forming the first layer patterns is reduced.
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Citations
20 Claims
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1. A method of designing a layout of an integrated chip (IC), the method comprising:
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designing a first layout by placing and routing a plurality of standard cells that define the IC; and generating a second layout by modifying the first layout during a mask data preparation process related to the first layout, wherein the second layout is generated by connecting first and second patterns from among first layer patterns corresponding to a first layer of the first layout, such that the number of masks necessary for forming the first layer patterns is reduced. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of manufacturing an integrated circuit (IC), the method comprising:
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providing a standard cell library that includes information about a plurality of standard cells that define the IC; designing a first layout by placing and routing the plurality of standard cells; determining, during a mask data preparation process related to the first layout, whether the number of masks necessary for forming first layer patterns that correspond to a first layer of the first layout is the same or greater than a threshold value; generating, when the number of masks necessary for forming the first layer patterns is the same or greater than the threshold value, the second layout by modifying the first layout; and forming the IC based on the second layout. - View Dependent Claims (14, 15)
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16. A method of designing a layout of a standard cell of an integrated circuit (IC), the method comprising;
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configuring a first layout by placing and routing a standard cell, the standard cell including first and second patterns from among first layer patterns corresponding to a first layer of the first layout; and configuring a second layout by modifying the first layout by connecting the first and second patterns among the first layer patterns so that the number of masks required to form the first layer patterns of the standard cell according to the second layout is reduced relative to the number of masks required to form the first layer patterns of the standard cell according to the first layout. - View Dependent Claims (17, 18, 19, 20)
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Specification