METHOD FOR MONITORING AN OPERATION LOCATION OF A SURFACE PROCESSING APPARATUS, AND MONITORING SYSTEM
First Claim
1. A method for monitoring an operation location of a surface processing apparatus, wherein a surface processing apparatus is allocated to a spatially delimited operation area by way of an allocating unit, and wherein the position of the surface processing apparatus is established, and it is determined whether the surface processing apparatus is disposed inside or outside the operation area, wherein the surface processing apparatus is allocated to a first operation area and at least one second operation area that is spatially separated from the first operation area, and wherein it is determinable whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area.
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Accused Products
Abstract
A method for monitoring an operation location of a surface processing apparatus is provided, wherein a surface processing apparatus is allocated to a spatially delimited operation area by way of an allocating unit, and wherein the position of the surface processing apparatus is established, and it is determined whether the surface processing apparatus is disposed inside or outside the operation area. For versatility, the surface processing apparatus is allocated to a first operation area and at least one second operation area that is spatially separated from the first operation area, and it is determinable whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area. Furthermore, the invention relates to a monitoring system for performing the method.
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Citations
37 Claims
- 1. A method for monitoring an operation location of a surface processing apparatus, wherein a surface processing apparatus is allocated to a spatially delimited operation area by way of an allocating unit, and wherein the position of the surface processing apparatus is established, and it is determined whether the surface processing apparatus is disposed inside or outside the operation area, wherein the surface processing apparatus is allocated to a first operation area and at least one second operation area that is spatially separated from the first operation area, and wherein it is determinable whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area.
- 19. A monitoring system comprising a surface processing apparatus and an allocating unit which is configured to allocate a spatially delimited operation area to the surface processing apparatus, wherein the position of the surface processing apparatus is establishable by means of a position sensor, and it is determinable whether the surface processing apparatus is disposed inside or outside the operation area, wherein the surface processing apparatus is configured to be allocated to a first operation area and to at least one second operation area that is spatially separated from the first operation area, and wherein it is determinable whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area.
Specification