SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
First Claim
1. A substrate processing method, comprising the steps of:
- supplying a coating liquid that includes a directed self assembly material constituted by two types of polymers onto a substrate to form a film made of the directed self assembly material on the substrate by a coater;
supplying an evaporated solvent to the substrate with the film formed thereon by a solvent supplier;
performing thermal processing on the substrate with the film formed thereon by a heater; and
irradiating the film on the substrate after the supply of the solvent and after the thermal processing with light by a light emitter.
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Accused Products
Abstract
An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.
53 Citations
11 Claims
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1. A substrate processing method, comprising the steps of:
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supplying a coating liquid that includes a directed self assembly material constituted by two types of polymers onto a substrate to form a film made of the directed self assembly material on the substrate by a coater; supplying an evaporated solvent to the substrate with the film formed thereon by a solvent supplier; performing thermal processing on the substrate with the film formed thereon by a heater; and irradiating the film on the substrate after the supply of the solvent and after the thermal processing with light by a light emitter. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A substrate processing apparatus, comprising:
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a coater that supplies a coating liquid that includes a directed self assembly material constituted by two types of polymers onto a substrate to form a film made of the directed self assembly material; a solvent supplier that supplies an evaporated solvent to the substrate with the film formed thereon; a heater that performs thermal processing on the substrate with the film formed thereon; and a light emitter that irradiates the film on the substrate after the supply of the solvent and after the thermal processing with light.
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Specification