METHOD FOR FABRICATING MAGNETIC CORE
First Claim
1. A method for fabricating a magnetic core, comprising:
- depositing a magnetic layer on a dielectric layer;
forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer;
etching the magnetic layer through the patterned first photoresist layer, wherein a first section of the magnetic layer exposed by the patterned first photoresist layer remains on the dielectric layer after etching the magnetic layer;
removing the patterned first photoresist layer;
forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer;
etching the magnetic layer through the patterned second photoresist layer; and
removing the patterned second photoresist layer.
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Accused Products
Abstract
A method for fabricating a magnetic core includes depositing a magnetic layer on a dielectric layer, forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer, etching the magnetic layer through the patterned first photoresist layer, in which a first section of the magnetic layer exposed by the first photoresist layer remains on the dielectric layer after the magnetic layer is etched, removing the patterned first photoresist layer, forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer, etching the magnetic layer through the patterned second photoresist layer, and removing the second photoresist layer.
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Citations
20 Claims
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1. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer on a dielectric layer; forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer; etching the magnetic layer through the patterned first photoresist layer, wherein a first section of the magnetic layer exposed by the patterned first photoresist layer remains on the dielectric layer after etching the magnetic layer; removing the patterned first photoresist layer; forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer; etching the magnetic layer through the patterned second photoresist layer; and removing the patterned second photoresist layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer over a dielectric layer; etching the magnetic layer through a first patterned photoresist layer, wherein a first section of the magnetic layer is exposed by the first patterned photoresist layer, and a second section of the magnetic layer is covered by the first patterned photoresist layer; and etching the first section of the magnetic layer through a second patterned photoresist layer, wherein the second section of the magnetic layer is covered by the second patterned photoresist layer. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer over a dielectric layer; etching the magnetic layer, such that the magnetic layer having a first section and a second section, and the second section is thicker than the first section; forming a first patterned photoresist layer over the second section, wherein the first section is exposed by the first patterned photoresist layer; etching the first section through the first patterned photoresist layer; and removing the first patterned photoresist layer. - View Dependent Claims (18, 19, 20)
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Specification