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Substrate provided with antireflection films and its production method

  • US 6,570,709 B2
  • Filed: 07/26/2001
  • Issued: 05/27/2003
  • Est. Priority Date: 07/27/2000
  • Status: Expired due to Fees
First Claim
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1. A substrate provided with antireflection films, which comprises a transparent substrate and two or three antireflection film layers deposited on one side of the transparent substrate in an order in which the first layer is deposited on one side of the transparent substrate, the second layer is deposited on the first layer on the side distal to the transparent substrate, and the third layer, when present, is deposited on the second layer on the side distal to the first layer,wherein the reflectance on the film face of light incident at an angle of incidence of 5°

  • from the film face side is at most 6% at the entire wavelength region ranging from 400 to 480 nm, and wherein the first layer is a thin film having a refractive index of from 1.6 to 2.6 and a geometrical film thickness of from 1.1 to 1.9 times the film thickness as an antireflection condition as obtained from the following formula; and

    the second layer is a thin film having a refractive index of from 1.4 to 1.56 and a geometrical film thickness of from 0.5 to 1.1 times the film thickness as an antireflection condition as obtained from the following formula;

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