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Method of forming crystalline semiconductor thin film on base substrate, lamination formed with crystalline semiconductor thin film and color filter

  • US 6,680,242 B2
  • Filed: 10/17/2001
  • Issued: 01/20/2004
  • Est. Priority Date: 03/19/2001
  • Status: Expired due to Term
First Claim
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1. A method of forming a crystalline semiconductor thin film on a base material, comprising:

  • applying UV-rays to an amorphous semiconductor thin film provided on a base material while keeping a temperature of the thin film at not less than 25°

    C. and not more than 300°

    C. in a vacuum or a reducing gas atmosphere.

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