×

Method for producing organic electronic devices on deposited dielectric materials

  • US 6,869,821 B2
  • Filed: 12/30/2002
  • Issued: 03/22/2005
  • Est. Priority Date: 12/30/2002
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for fabricating an organic electronic device comprising:

  • depositing a dielectric material over a substrate;

    plasma treating the dielectric material; and

    depositing an organic semiconductor film over the plasma treated dielectric material, wherein plasma treating the dielectric material comprises utilizing a gas selected from the group consisting of Nitrogen (N2) and Argon (Ar), and wherein plasma treating the dielectric material comprises placing the substrate in a reactor chamber maintained in a range 200 to 500 mTorr, and flowing the gas at a rate in the range of 100-200 sccm.

View all claims
  • 5 Assignments
Timeline View
Assignment View
    ×
    ×