Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same
First Claim
1. A composition of matter consisting essentially of a reaction product of(i) a photo or electron beam curable material component comprising a material having the backbone of a completely or substantially completely hydrogenated hydrocarbon based rubber material, which is completely or substantially free of carbon-carbon double and triple bonds, and bears at least one photo or electron beam polymerizable terminal or pendant group;
- (ii) a photoinitiator/photosensitizer component having essentially no volatility at room temperature and also yielding photoproducts after exposure to actinic radiation that have minimal or no volatility at room temperature;
(iii) an optional viscosity adjustment component that is either homopolymerizable or is capable of copolymerizing with the photo or electron beam curable material component of(i); and
(iv) an optional inert filler,wherein, the composition of matter, when cured, has a low outgassing rate such that it passes the ASTM-E-595-93 (1999) test and a low outgassing rate when exposed to ultraviolet radiation having a wavelength less than or equal to about 248 nm.
1 Assignment
0 Petitions
Accused Products
Abstract
Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
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Citations
14 Claims
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1. A composition of matter consisting essentially of a reaction product of
(i) a photo or electron beam curable material component comprising a material having the backbone of a completely or substantially completely hydrogenated hydrocarbon based rubber material, which is completely or substantially free of carbon-carbon double and triple bonds, and bears at least one photo or electron beam polymerizable terminal or pendant group; -
(ii) a photoinitiator/photosensitizer component having essentially no volatility at room temperature and also yielding photoproducts after exposure to actinic radiation that have minimal or no volatility at room temperature; (iii) an optional viscosity adjustment component that is either homopolymerizable or is capable of copolymerizing with the photo or electron beam curable material component of(i); and (iv) an optional inert filler, wherein, the composition of matter, when cured, has a low outgassing rate such that it passes the ASTM-E-595-93 (1999) test and a low outgassing rate when exposed to ultraviolet radiation having a wavelength less than or equal to about 248 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 12, 13, 14)
and compatible mixtures thereof and/or compatible combinations thereof.
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6. A composition of matter in accordance with claim 1, wherein the inert filler is an inorganic filler selected from the group consisting of alumina, crystobalite, aluminum trihydroxide, talc, feldspar, calcium carbonate, mica, clay, wallastonite, nepeleline syenite, silica, and compatible mixtures thereof and compatible combinations thereof.
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7. A cured composition of matter obtained by exposing the composition of claim 1 to visible light, ultraviolet light or electron beam.
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8. A composition of matter in accordance with claim 7, which has a low modulus ranging from 25 to 10,000 psi (1.7×
- 105 to 6.8×
107 Pa).
- 105 to 6.8×
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9. A composition of matter in accordance with claim 7, which has a Tg of equal to or lower than 25°
- C.
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12. A composition of matter in accordance with claim 1, wherein the photo or electron beam curable material component of (i) is functionalized by at least one polymerizable terminal or pendant group selected from the group consisting of:
- acrylate, methacrylate, acrylamide, maleimide, thioacrylate, thiomethacrylate, vinyl sulfide, itaconate, crotonate, styrene and N-vinyl amide, hydroxyl, thiol, oxetane, episulfide, vinyl ether, propenyl ether, allyl ether, and compatible mixtures and/or combinations thereof.
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13. A composition of matter in accordance with claim. 1, which is essentially free of silicone.
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14. A process according to claim 12, wherein steps (B) and (C) are performed in an environment essentially free of silicone.
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10. A process for producing a cured composition of matter having low outgassing rate and low modulus between 25 and 10,000 psi (1.7×
- 105 to 6.8×
107 Pa), comprising the following steps of;(A) providing a rubber material (i) (a) having a backbone that is completely or substantially completely free of carbon-carbon double bond and triple bond and (b) comprising terminal and/or pendant groups tat are photo and/or electron beam polymerizable; (B) mixing the material (i) with a photoinitiator/photosensitizer (ii) having essentially no volatility at room temperature and also yielding photoproducts after exposure to actinic radiation that have minimal or no volatility at room temperature;
(iii) an optional viscosity adjustment component that is either homopolymerizable or is capable of copolymerizing wit material (i); and
(iv) an optional inert filler;(C) curing the mixture resulting from step (B) by visible light, UV light or electron beam to form a cured composition of matter having low outgassing rate and low modulus, wherein the cured composition has an outgassing rate tat is sufficient to pass the ASTM-E-595-93 (1999) test and a low outgassing rate when exposed to ultraviolet radiation having a wavelength less than or equal to about 248 nm. - View Dependent Claims (11)
- 105 to 6.8×
Specification